PVD Magnetron Sputting Coating Machine

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About

TECHNICAL PARAMETERS

Key Features

PVD Magnetron Sputting Coating Machine

Make use of the principle of magnetron sputtering to plate the foil surface with nano-scale coating.
In the field of composite current collector, nano-scale copper seed layer can be plated on the surface of PP/PET film.

Technical Parameters

Item

Parameter

Film forming width

Customized, 800-1700mm

Film forming speed

8-50m/min

Coating layer thickness

20-80nm

Composite copper foil coated film resistance

1-2.5 Ω

Maximum coated roll diameter

Φ600mm

Key Features

Transfer the target material to the attachment based on the principle of magnetron sputtering

Built-in winding mechanism, mainly for foil that can be unwound and rewound

Thin coating (ranging from several nm to several hundred nm) varies greatly due to different target materials

Temperature, torque, speed and other parameters are independently controlled at all levels

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PVD Magnetron Sputting Coating Machine

PVD Magnetron Sputting Coating Machine

Technical Parameters

Key Features

Building the Future Together